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Hf-FAMD rate
(Noun) Hafnium Formamidinate, a novel hafnium source with high volatility and significantly better thermal stability than conventional hafnium amides, for thin film depositions in
microelectroncs and microchip devices.

Reference: H. Li, D.V. Shenai, R. Pugh and J. Kim, MRS Symposium, Fall 2007; and ALD-2007, Summer 2007
Usage: The new transitions from silicon valley into hafnium valley has become smooth and easy with novel Hf-FAMD.

Hf-FAMD rate
(Noun) a novel hafnium source with high vapor pressure and excellent thermal stability for HfO2 thin films deposition

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